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Composition And Method For Removing Photoresist Materials From Electronic Components

Details

Project TitleComposition And Method For Removing Photoresist Materials From Electronic Components
Track CodeU.S. Patent No. 6,403,544 (DOE S-94,672)
Websitewww.lanl.gov/partnerships
Short Description

Los Alamos National Laboratory - Express Licensing Program

The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group: ##STR1## wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R.sub.1 and R.sub.2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R.sub.1 or R.sub.2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.

AbstractNone
 
Tagsphotoresist, materials, remove, photoresist removal
 
Posted DateApr 5, 2013 7:55 PM

Licensing Terms and Conditions

This patent is offered for Non-Exclusive licensing through Los Alamos National Laboratory's Express Licensing Program.  The financial terms for an Express License are listed below:

One-Time Non-Exclusive License Issue Fee:

Seven Thousand Five Hundred ($7,500) U.S. Dollars

Annual License Fee:

Five Hundred ($500) U.S. Dollars

Earned Royalties on Sales:

Two Percent (2.0%)

To submit a license request, please contact Laura Barber, Mike Erickson or Marcus Lucero at Licensing@lanl.gov. Upon receipt of an Express License request, LANL will review your request to ensure that it meets the Express Licensing requirements, and if so, will send you a copy of the non-negotiable Non-Exclusive License Agreement for execution.

Intellectual Property

Patent Number Issue Date Type Country of Filing
U.S. Patent No. 6,403,544 Jun 11, 2002 Utility United States